60928 Organic Vapor/Acid Gas Cartridge/Filter - P100, Use on Bayonet Fitting (Set of 2)

These are combinations of one of several 3M vapor cartridges coupled with an integral P100 particulate filter.

These combination vapor cartridge/filters are useful in a variety of applications and industries including automotive, metal production and fabrication, grinding, painting, demolition, construction, petrochemical and chemical processing, utilities, pharmaceuticals, and mining.

These cartridge/filters are NIOSH approved against certain organic vapors, acid gases, and particulates.
The P100 rating indicates an extraordinary 99.97% filtering efficiency.

The cartridge/filter can attach directly to any 3M™ bayonet facepiece.

Full facepieces must be quantitatively fit tested to claim assigned protection factor above 10 in negative pressure mode.

• Do not use in environments that are immediately dangerous to life or health (IDLH)
• Do not use for sandblasting
• Dimensions - 4.2"L x 3.4"W
• Priced and sold by the pair

Note that for this cartridge, unlike all the other cartridges in this series, the part number for ordering the cartridge is NOT the same as the number printed on the cartridge.


Heavy on the technical side...
When properly fitted, the 60926 Organic Vapor/Multi-Gas cartridge/filter helps provide respiratory protection from particulates, as well as certain organic vapors, chlorine, hydrogen chloride, chlorine dioxide, sulfur dioxide, hydrogen sulfide, ammonia, methylamine, formaldehyde*, or hydrogen fluoride at concentrations up to 10 times the Permissible Exposure Limit (PEL) with half facepieces, or 50 times PEL with full facepieces.
* Note that OSHA requires that gas-proof goggles be worn with half facepiece respirators when used against formaldehyde.

When properly fitted, the 60928 Organic Vapor/Acid Gas cartridge/filter helps provide respiratory protection from particulates, as well as certain organic vapors and certain acid gases such as chlorine, sulfur dioxide, hydrogen fluoride, as well as radioiodine and methyl bromide under limited concentration and time conditions.